Ontology Reuse Engineering and Ontology Development
2015 (English)In: KEOD 2015 - Proceedings of the International Conference on Knowledge Engineering and Ontology Development, part of the 7th International Joint Conference on Knowledge Discovery, Knowledge Engineering and Knowledge Management (IC3K 2015), Volume 2, Lisbon, Portugal, November 12-14, 2015 / [ed] Ana Fred, Jan Dietz, David Aveiro, Kecheng Liu, Joaquim Filipe, SciTePress, 2015, p. 163-170Conference paper, Published paper (Refereed)
Resource type
Text
Abstract [en]
While the main purpose of Ontology Design Patterns (ODPs) is to support the process of ontology engineering, they can also be used to improve existing ontologies. This paper has a focus on ODP selection and integration for ontology improvement. Based on the case of the ExpertFinder ontology, which allows for competency description of researchers, selection and integration of ODP is investigated with an explorative view. The current state of ODP selection strategies is discussed and problems arising during integration of ODP are shown. On this base, suggestions for improvements are made. Although this study deals with the integration into an existing ontology, most of the assumptions and suggestions are also valid for the general case of ODP usage.
Place, publisher, year, edition, pages
SciTePress, 2015. p. 163-170
Keywords [en]
Ontology Design Pattern (ODP), Ontology Alignment, ODP Selection, ODP Integration, Ontology Engineering, Ontology Reuse
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:hj:diva-28599DOI: 10.5220/0005586301630170ISBN: 978-989-758-158-8 (print)OAI: oai:DiVA.org:hj-28599DiVA, id: diva2:881806
Conference
International Conference on Knowledge Engineering and Ontology Development, part of the 7th International Joint Conference on Knowledge Discovery, Knowledge Engineering and Knowledge Management (IC3K 2015), Volume 2, Lisbon, Portugal, November 12-14, 2015
2015-12-112015-12-112025-10-13Bibliographically approved